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Sapphire Wafers

Sapphire-Wafers with a very low surface roughness in all orientations (C- A- R- M- Plane) and, if desired, with a miscut.

Suitable for various applications, e.g. Optics industry, military and semiconductors. The growth method can be HEM or Kyropolos, depending on customer preference or availability.

For sapphire wafers, we also offer various services, such as antireflection coatings or laser processing.

If you need assistance please do not hesitate to contact us! We will be pleased to advise you by phone at + 49-(0)241/900 5333 or by e-mail.

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Stock List: Sapphire Wafers

Typical Sapphire-Wafer Specifications:

Diameter
2" (50.8 mm)
3" (76.2 mm)
100 mm
125 mm
150 mm
200 mm

Growth
Kyropolos
HEM

Purity
≥99.99 %

Orientation
C-Plane (0001)
A-Plane (11-20)
R-Plane (1-102)
M-Plane (10-10)

Surface Finish
Optical Polished
Epi-Polished
Fine Ground
As Lapped

Surface roughness
Polished: Ra<=0.3 nm
Fine Ground: <1 µm
As Lapped: <1 µm