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Overall
Device
BOX
Handle
Part-No.
Diameter
Diamater tol.
Size
Finish
Device Type
Device Dopant
Device Orientation
Device Resistivity
Thickness
Device TTV
Thickness
Handle Type
Handle Dopant
Handle Orientation
Handle Resistivity
Thickness
Handle TTV
Qty
Remarks
SW42002
/
/
/
Single Side Polished
P
B
<100>
1-100
100 ±1 µm
<1.5
500 nm
P
B
<100>
1-100
725 ±5 µm
/
4
SiO2 on backside
E44494
100
0,5
/
/
P
B
<100> ±0.5°
1-30
5 ±0.8 µm
/
20.000 Å ±5 %
P
B
<100> ±0.5°
1-30
525 ±15 µm
/
1
/
E44495
100
0,5
/
/
P
B
<100> ±0.5°
1-30
20 ±1 µm
/
20.000 Å ±5 %
P
B
<100> ±0.5°
1-30
525 ±15 µm
/
1
/
E44477
100
0,5
/
Etched/Etched
N
Sb
/
0.008-0.02
400-525 ±25 µm
/
2 µm ±5%
N
Ph
/
1-10
400-525 ±5 µm
/
48
/
SW44114
100
0,5
/
/
/
/
/
/
20 ±1 µm
<1 µm
1000 nm ±5%
/
/
/
/
440 ±20 µm
/
44
/
SW44115
100
0,3
/
/
P
B
<100> ±0.5°
10-20
20.5 ±1 µm
<1 µm
1.000 nm ±5%
P
B
<100> ±0.5°
10-20
440 ±20 µm
<1 µm
3
SiO2 on backside
E46066
150
0,5
/
Double Side Polished
P
B
<100> ±1°
0.01-0.02
100 ±1 µm
<2 µm
10.000 Å ±5 %
P
B
<100> ±1°
0.01-0.02
300 ±10 µm
/
13
/
AI46001
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
25 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
214
SiO2 on backside
AI46002
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
48.6 ±0.5 µm
<1 µm
2.0 µm ±5%
N
RPh
<100> ±0.5°
<0.002
500 ±5 µm
/
143
SiO2 on backside
AI46003
150
0,2
/
Double Side Polished
N
RPh
<100> ±0.2°
0.01-0.02
40 ±0.3 µm
<1 µm
2.0 µm ±5%
N
Ph
<100> ±0.2°
0.01-1
710 ±5 µm
/
130
SiO2 on backside
AI46004
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
25 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
23
SiO2 on backside
AI46005
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
1-5
22 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
3
SiO2 on backside
AI46006
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
4.6 ±0.4 µm
<1 µm
2.1 µm ±5%
P
B
<100> ±0.5°
1-5
550 ±5 µm
/
67
SiO2 on backside
AI46007
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
0.02-0.04
5 ±0.3 µm
<1 µm
1.0 µm ±5%
N
Ph
<100> ±0.5°
1-5
400 ±5 µm
/
3
SiO2 on backside
AI46011
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
40 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
65
SiO2 on backside
AI46012
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
9 ±0.5 µm
<1 µm
0.5 µm ±10%
P
B
<100> ±0.5°
0.01-0.02
400 ±5 µm
/
10
SiO2 on backside
AI46013
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
155 ±2 µm
/
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
1000 ±7 µm
/
4
SiO2 on backside
AI46020
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
22 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
3
SiO2 on backside
AI46021
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
28.4 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
550 ±5 µm
/
3
SiO2 on backside
AI46025
150
0,2
/
Double Side Polished
N
RPh
<100> ±0.5°
0.01-0.02
60 ±0.6 µm
<1 µm
0.5 µm ±5%
N
RPh
<100> ±0.5°
0.01-0.02
500 ±5 µm
<1 µm
13
SiO2 on backside
AI46026
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
9 ±0.5 µm
<1 µm
0.5 µm ±10%
P
B
<100> ±0.5°
0.01-0.02
300 ±5 µm
/
20
SiO2 on backside
AI46027
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
32 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
25
SiO2 on backside
AI46046
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
1-10
8 ±0.5 µm
<1 µm
0.5 µm ±10%
N
Ph
<100> ±0.5°
1-10
400 ±5 µm
/
27
SiO2 on backside
AI46047
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
/
15 ±1 µm
/
0.5 µm ±10%
N
Ph
<100> ±0.5°
3-9
500 ±5 µm
/
1
SiO2 on backside
AI46048
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
0.01-0.02
48.6 ±0.5 µm
<1 µm
2.0 µm ±5%
N
RPh
<100> ±0.5°
0.001-0.005
500 ±5 µm
/
21
SiO2 on backside
AI46053
150
0,2
/
Double Side Polished
N
Ph
<111> ±0.5°
0.01-0.1
40 ±0.5 µm
<1 µm
2.0 µm ±10%
N
Ph
<100> ±0.5°
0.1-1
710 ±5 µm
/
3
SiO2 on backside
AI46057
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
47 ±1 µm
<1 µm
1.0 µm ±5%
N
RPh
<100> ±0.5°
<0.002
500 ±5 µm
/
6
SiO2 on backside
AN46003
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
<0.005
33 ±0.3 µm
<1 µm
1.0 µm ±5%
N
Ph
<100> ±0.5°
<0.005
550 ±5 µm
/
16
SiO2 on backside
AN46005
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
<0.005
100 ±0.5 µm
<1 µm
1.0 µm ±5%
N
Ph
<100> ±0.5°
<0.005
500 ±5 µm
/
7
SiO2 on backside
AN46007
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
<0.0015
40 ±0.5 µm
<1 µm
1.0 µm ±5%
N
Ph
<100> ±0.5°
<0.0015
500 ±5 µm
/
70
SiO2 on backside
AN46011
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
0.01-0.02
41.5 ±0.5 µm
<1 µm
1.0 µm ±5%
N
Ph
<100> ±0.5°
0.01-0.02
500 ±5 µm
/
1
SiO2 on backside
AN46015
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
0.1-3
30 ±1 µm
<2 µm
0.5 µm ±5%
N
Ph
<100> ±0.5°
5-30
500 ±5 µm
/
9
SiO2 on backside
AN46017
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
5 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
0.01-0.02
550 ±5 µm
/
55
SiO2 on backside
AN46019
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
28.4 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
550 ±5 µm
/
98
SiO2 on backside
AN46021
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
20 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
15
SiO2 on backside
AN46024
150
0,2
/
Single Side Polished
P
B
<100> ±0.5°
1-5
100 ±1 µm
<2 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
550 ±5 µm
/
14
SiO2 on backside
AN46025
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
1-3
12.5 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
4
SiO2 on backside
AN46026
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
1-5
10 ±0.5 µm
<1 µm
1.0 µm ±5%
N
Ph
<100> ±0.5°
1-5
550 ±5 µm
/
1
SiO2 on backside
AN46027
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
33 ±0.3 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
180
SiO2 on backside
AN46032
150
0,2
/
Single Side Polished
P
B
<100> ±0.5°
1-5
100 ±1 µm
<2 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
675 ±25 µm
/
40
/
AN46034
150
0,2
/
Double Side Polished
N
Sb
<100> ±0.5°
0.008-0.02
20 ±0.5 µm
<1 µm
3.0 µm ±5%
N
Sb
<100> ±0.5°
0.008-0.02
627 ±5 µm
/
17
SiO2 on backside
AN46035
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
48.6 ±0.5 µm
<1 µm
2.0 µm ±5%
N
Ph
<100> ±0.5°
<0.002
500 ±5 µm
/
182
SiO2 on backside
AN46037
150
0,2
/
Double Side Polished
N
Sb
<100> ±0.5°
0.008-0.02
20 ±0.5 µm
<1 µm
3.0 µm ±5%
N
Sb
<100> ±0.5°
0.008-0.02
627 ±5 µm
/
6
SiO2 on backside
CJ46001
150
0,2
/
Single Side Polished
P
B
<100> ±0.5°
1-5
100 ±1 µm
<2 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
550 ±10 µm
/
90
/
CJ46002
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
25 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
50
SiO2 on backside
CJ46004
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
4.6 ±0.4 µm
<1 µm
2.1 µm ±5%
P
B
<100> ±0.5°
1-5
550 ±5 µm
/
50
SiO2 on backside
CJ46005
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
0.01-0.02
40 ±0.5 µm
<1 µm
2.0 µm ±5%
N
Ph
<100> ±0.5°
0.01-1
710 ±10 µm
/
35
/
CJ46006
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
33 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
550 ±5 µm
/
195
SiO2 on backside
CL46001
150
0,5
/
Double Side Polished
P
B
<100> ±0.5°
any
33 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
any
550 ±5 µm
/
20
/
CL46002
150
0,5
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
25 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
6
/
CL46003
150
0,5
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
40 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
4
/
SW46001
150
0,5
/
Double Side Polished
P
B
<100>
10-20
8 ±0.5 µm
<1
1.0 µm ±5%
P
B
<100>
15-25
675 ±20 µm
/
4
SiO2 on backside
SW46110
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
16.5 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
0.01-0.02
380 ±5 µm
/
8
SiO2 on backside
SW46111
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
16 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
0.01-0.02
380 ±5 µm
/
3
SiO2 on backside
SW46115
150
5
/
/
P
B
<100> ±0.5°
1-10
50 ±1 µm
<1 µm
500nm ±5%
P
B
<100> ±0.5°
1-30
625 ±25 µm
/
50
SiO2 on backside
SW46116
150
5
/
/
P
B
<100> ±0.5°
1-10
100 ±2 µm
<1 µm
2 µm ±5%
P
B
<100> ±0.5°
1-30
625 ±25 µm
/
50
SiO2 on backside
SW46118
150
0,3
/
/
P
B
<100> ±0.5°
1-10
100 ±1 µm
<1 µm
500 nm ±5%
P
B
<100> ±0.5°
1-30
625 ±25 µm
<1 µm
31
SiO2 on backside
SW46119
150
0,3
/
/
P
B
<100> ±0.5°
1-10
99 ±1 µm
<1 µm
500 nm ±5%
P
B
<100> ±0.5°
1-30
625 ±25 µm
<1 µm
7
SiO2 on backside
SW46120
150
0,3
/
/
P
B
<100> ±0.5°
1-10
100 ±2 µm
<1.5 µm
500 nm ±5%
P
B
<100> ±0.5°
1-30
625 ±25 µm
<1 µm
8
SiO2 on backside
SW46121
150
0,3
/
/
P
B
<100> ±0.5°
1-10
94 ±1 µm
<1 µm
500 nm ±5%
P
B
<100> ±0.5°
1-30
625 ±25 µm
<1 µm
3
SiO2 on backside
SW46114
150
5
/
/
P
B
<100> ±0.5°
1-10
10 ±1 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-30
625 ±25 µm
/
50
SiO2 on backside
SW48010
200
0,5
/
Single Side Polished
P
B
<100> ±0.5°
1-100
100 ±1 µm
<1.5
500nm ±5 %
P
B
<100> ±0.5°
1-100
725 ±5 µm
/
23
SiO2 on backside
SW48037
200
0,5
/
Double Side Polished
N
Ph
<100> ±0.5°
1-50
120 ±2 µm
<2 µm
1.0 µm ±5 %
N
Ph
<100> ±0.5°
500-1000
610 ±15 µm
<10 µm
1
/
SW48042
200
0,5
/
Double Side Polished
N
Ph
<100> ±0.5°
1-50
60 ±1.5 µm
<2 µm
1.0 µm ±5 %
N
Ph
<100> ±0.5°
800-1500
670 ±15 µm
<10 µm
15
/
E48032
200
0,5
/
Double Side Polished
P
B
<100> ±0.5°
1-50
40 ±1 µm
<2 µm
10.000 Å ±5%
P
B
<100> ±0.5°
1-50
680 ±15 µm
/
1
/
E48098
200
0,5
/
Double Side Polished
P
B
<100> ±1°
1-30
20 ±0.5 µm
/
10.000 Å ±5%
P
B
<100> ±1°
1-30
550 ±25 µm
/
1
SiO2 on backside
CU48001
200
0,5
/
Double Side Polished
/
/
/
0.01-0.02
10 ±0.20 µm
/
1 µm ±5 %
/
/
/
10-20
500 ±7 µm
/
1235
SiO2 on backside
CU48002
200
0,5
/
Double Side Polished
/
/
/
10-20
2.5 ±0.20 µm
/
0.96 µm ±5 %
/
/
/
10-20
500 ±7 µm
/
812
SiO2 on backside
CU48003
200
0,5
/
Double Side Polished
/
/
/
10-20
1.7 ±0.20 µm
/
0.96 µm ±5 %
/
/
/
10-20
500 ±7 µm
/
820
SiO2 on backside
CU48004
200
0,5
/
Double Side Polished
/
/
/
0.20-0.60
65 ±0.50 µm
/
1.5 µm ±7 %
/
/
/
0.01-0.02
435 ±7 µm
/
675
SiO2 on backside
CU48005
200
0,5
/
Double Side Polished
/
/
/
10-20
2.5 ±0.20 µm
/
0.96 µm ±5 %
/
/
/
0.2-0.6
500 ±7 µm
/
170
SiO2 on backside
CV48001
200
0,2
/
Polished
P
B
/
8.5-11.5
220 ±20 nm
/
2 ±0.05 µm
P
B
/
14-18.9
725 ±20 µm
/
8
SiO2 on backside

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