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Overall
Device
BOX
Handle
Part-No.
Diameter
Diamater tol.
Size
Finish
Device Type
Device Dopant
Device Orientation
Device Resistivity
Thickness
Device TTV
Thickness
Handle Type
Handle Dopant
Handle Orientation
Handle Resistivity
Thickness
Handle TTV
Qty
Remarks
E43013
76,2
0,5
/
Double Side Polished
N
Ph
<100> ±0.5°
1-10
5 ±0.5 µm
<1 µm
0.25 µm ±5 %
P
B
<100> ±0.5°
1-20
380 ±15 µm
/
16
/
E46012
150
0,5
/
Double Side Polished
P
B
<100> ±0.5°
1-50
40 ±1 µm
<2 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-50
610 ±15 µm
<3 µm
3
+ 2000 nm SiO2
AI46001
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
25 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
231
SiO2 on backside
AI46002
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
48.6 ±0.5 µm
<1 µm
2.0 µm ±5%
N
RPh
<100> ±0.5°
<0.002
500 ±5 µm
/
168
SiO2 on backside
AI46003
150
0,2
/
Double Side Polished
N
RPh
<100> ±0.2°
0.01-0.02
40 ±0.3 µm
<1 µm
2.0 µm ±5%
N
Ph
<100> ±0.2°
0.01-1
710 ±5 µm
/
132
SiO2 on backside
AI46004
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
25 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
33
SiO2 on backside
AI46005
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
1-5
22 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
28
SiO2 on backside
AI46006
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
4.6 ±0.4 µm
<1 µm
2.1 µm ±5%
P
B
<100> ±0.5°
1-5
550 ±5 µm
/
97
SiO2 on backside
AI46008
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
1.5 ±0.3 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
36
SiO2 on backside
AI46009
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
14 ±0.5 µm
<1 µm
0.5 µm ±10%
P
B
<100> ±0.5°
0.01-0.02
300 ±5 µm
/
4
SiO2 on backside
AI46010
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
3.0 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
300 ±5 µm
/
8
SiO2 on backside
AI46011
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
40 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
65
SiO2 on backside
AI46012
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
9 ±0.5 µm
<1 µm
0.5 µm ±10%
P
B
<100> ±0.5°
0.01-0.02
400 ±5 µm
/
25
SiO2 on backside
AI46013
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
155 ±2 µm
/
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
1000 ±7 µm
/
22
SiO2 on backside
AI46014
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
5 ±0.5 µm
<1 µm
1 µm ±5%
P
B
<100> ±0.5°
0.01-0.02
550 ±5 µm
/
4
SiO2 on backside
AI46015
150
0,2
/
Double Side Polished
N
RPh
<100> ±0.5°
<0.002
200 ±5 µm
/
3 µm ±5%
N
Ph
<100> ±0.5°
1-5
380 ±5 µm
/
42
SiO2 on frontside
AI46016
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
115 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
525 ±5 µm
/
5
SiO2 on backside
AI46017
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
18.5 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
0.01-0.02
380 ±5 µm
/
16
SiO2 on backside
AI46018
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
200-500
25 ±1 µm
/
1.5 µm ±5%
N
Ph
<100> ±0.5°
1-5
380 ±20 µm
/
50
SiO2 on frontside
AI46019
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
120 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
525 ±5 µm
/
15
SiO2 on backside
AI46020
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
22 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
4
SiO2 on backside
AI46021
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
28.4 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
550 ±5 µm
/
6
SiO2 on backside
AI46022
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
60 ±0.5 µm
<1 µm
0.5 µm ±5%
P
B
<100> ±0.5°
0.01-0.02
500 ±5 µm
/
4
SiO2 on backside
AI46023
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
17-23
2.1 ±0.4 µm
<1 µm
0.5 µm ±5%
P
B
<100> ±0.5°
4.8-7.2
675 ±5 µm
/
12
SiO2 on backside
AI46024
150
0,2
/
Double Side Polished
N
RPh
<100> ±0.5°
0.02-0.04
2 ±0.4 µm
<1 µm
1 µm ±5%
N
Ph
<100> ±0.5°
1-5
400 ±5 µm
/
20
SiO2 on backside
AI46025
150
0,2
/
Double Side Polished
N
RPh
<100> ±0.5°
0.01-0.02
60 ±0.6 µm
<1 µm
0.5 µm ±5%
N
RPh
<100> ±0.5°
0.01-0.02
500 ±5 µm
<1 µm
24
SiO2 on backside
AI46026
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
9 ±0.5 µm
<1 µm
0.5 µm ±10%
P
B
<100> ±0.5°
0.01-0.02
300 ±5 µm
/
25
SiO2 on backside
AI46027
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
32 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
49
SiO2 on backside
AI46028
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
1-5
140 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
350 ±5 µm
/
2
SiO2 on backside
AI46029
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
1-5
24 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
350 ±5 µm
/
3
SiO2 on backside
AI46030
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
4.6 ±0.4 µm
<1 µm
2.1 µm ±5%
P
B
<100> ±0.5°
1-5
550 ±5 µm
/
5
SiO2 on backside
AI46032
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
5 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
0.01-0.02
400 ±5 µm
<1 µm
8
SiO2 on backside
AI46033
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
3 ±0.5 µm
<1 µm
1.5 µm ±5%
P
B
<100> ±0.5°
1-5
300 ±5 µm
/
25
SiO2 on backside
AI46034
150
0,2
/
Double Side Polished
N
RPh
<111> ±0.5°
0.01-0.04
150 ±1 µm
<1.5 µm
1.0 µm ±5%
N
Ph
<100> ±0.5°
1-5
380 ±5 µm
<1.5 µm
5
SiO2 on backside
AI46035
150
0,2
/
Double Side Polished
N
RPh
<100> ±0.5°
0.01-0.02
27 ±0.5 µm
<1 µm
1 µm ±5%
N
RPh
<100> ±0.5°
0.01-0.02
300 ±5 µm
/
11
SiO2 on backside
AI46036
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.3-0.5
30 ±0.5 µm
<1 µm
2 µm ±5%
P
B
<100> ±0.5°
1-10
300 ±5 µm
/
9
SiO2 on backside
AI46037
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
1-4
50 ±0.5 µm
<1 µm
2 µm ±5%
N
Ph
<100> ±0.5°
1-10
500 ±5 µm
/
21
SiO2 on backside
AI46038
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
150 ±2 µm
<2
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
500 ±5 µm
<2
46
SiO2 on backside
AI46039
150
0,2
/
Double Side Polished
N
RPh
<100> ±0.5°
<0.015
62 ±0.5 µm
<1 µm
1 µm ±5%
N
RPh
<100> ±0.5°
<0.015
500 ±5 µm
/
17
SiO2 on backside
AI46040
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
20 ±0.5 µm
<1
2.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
5
SiO2 on backside
AI46041
150
0,2
/
Double Side Polished
N
Sb
<100> ±0.5°
0.01-0.02
10 ±0.4 µm
<1
2.0 µm ±5%
N
Ph
<100> ±0.5°
10-20
400 ±5 µm
<1
12
SiO2 on backside
AI46042
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
300 ±3 µm
<1
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
625 ±5 µm
<1
9
SiO2 on backside
AI46043
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
0.01-0.02
20 ±0.5 µm
<1
1.0 µm ±5%
P
B
<100> ±0.5°
0.01-0.02
380 ±5 µm
<1
25
SiO2 on backside
AI46044
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
49 ±0.5 µm
<1
1.0 µm ±5%
N
RPh
<100> ±0.5°
<0.002
500 ±5 µm
/
21
SiO2 on backside
AI46045
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
5 ±0.5 µm
<1 µm
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
380 ±5 µm
/
55
SiO2 on backside
AI46046
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
1-10
8 ±0.5 µm
<1 µm
0.5 µm ±10%
N
Ph
<100> ±0.5°
1-10
400 ±5 µm
/
37
SiO2 on backside
AI46047
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
/
15 ±1 µm
/
0.5 µm ±10%
N
Ph
<100> ±0.5°
3-9
500 ±5 µm
/
1
SiO2 on backside
AI46048
150
0,2
/
Double Side Polished
N
Ph
<100> ±0.5°
0.01-0.02
48.6 ±0.5 µm
<1
2.0 µm ±5%
N
RPh
<100> ±0.5°
0.001-0.005
500 ±5 µm
/
21
SiO2 on backside
AI46049
150
0,2
/
Double Side Polished
P
B
<100> ±0.5°
1-5
120 ±0.5 µm
<1
1.0 µm ±5%
P
B
<100> ±0.5°
1-5
400 ±3 µm
/
10
SiO2 on backside
E48023
200
0,5
/
Double Side Polished
P
B
<100> ±0.5°
1-50
60 ±1.5 µm
<2 µm
1.0 µm ±5 %
P
B
<100> ±0.5°
>1000
670 ±15 µm
<10 µm
2
/

Stock Items Inquiry